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ABOUT
About I TECH U
Business
Partners
Contact
TECHNOLOGY
About ALD
2D Materials
Oxides
Nitrides and Metals
PRODUCTS
Simple ALD
High temperature ALD
Classic ALD
Special ALD
SERVICE
Thin Film Deposition
Equipment Modulation
Technical Consultancy
SUPPORT
Support
KOR
menubar
menubar
menubar
KOR
ABOUT
About I TECH U
Business
Partners
Contact
TECHNOLOGY
About ALD
2D Materials
Oxide
Nitrides and Metals
PRODUCTS
Simple ALD
High temperature ALD
Classic ALD
Special ALD
SERVICE
Thin film Deposition
Equipment Modulation
Technical Consultancy
SUPPORT
SUPPORT
IH Series
Model IH - 10
Specification
Chamber Type
Tube type( 100 ~ 800 mm)
Substrate Temperature
Up to 1100 ℃
Precursor sources
Up to 3
Reactant
H
2
O , O
3
, O
2
, NH
3
& Other gases for 2D materials
Equipment size
1500 ×600 × 1000 mm
Control system
PC control (auto)