SUPPORT
IS Series
Model IS - 10
Specification
| Chamber Type | Tube type |
|---|---|
| Substrate Temperature | Up to 250 ℃ |
| Precursor sources | Up to 3 |
| Reactant | H2O , O3 , O2 , NH3 & Other gases for ALD |
| Equipment size | 1300 ×600 × 1000 mm |
| Control system | PC control (auto) |