Model IC - 10
Chamber Type | Tube type( 2 ~ 8 inch) |
---|---|
Substrate Temperature | Up to 450 ℃ |
Precursor sources | Up to 3 |
Reactant | H2O , O3 , O2 , NH3 Gas & Plasma |
Equipment size | 1500 ×1000 × 1500 mm |
Control system | PC control (auto) |
*Available for attaching loadlock chamber.
MODEL : ISH-10
Chamber Type | Wafer(shower head) type( 6 inch) |
---|---|
Substrate Temperature | Up to 450 ℃ |
Precursor sources | Up to 3 |
Reactant | H2O , O3 , O2 , NH3 Gas & Plasma |
Equipment size | 1500 × 1200 × 1500 mm |
Control system | PC control (auto) |