SUPPORT
In Semiconductor

- Requirement for High-k material
- Leakage currents ↓ → Large band gap
- Thermal & chemical stability
- Appropriate characteristics with electrodes
- Available High-k materials
- AI2O3,HfO2,ArO2,Ta2O5,etc.
- Doping with various atoms (Si, Ge, rare earth elements, etc.)
In Display

- Low temperature ALD for flexible device
- Channel materials : ZnO, ZnO:N, etc.
- Gate insulator : Al2O3, SiO2, etc.

- TCO for transparent TFT
- ZnO based electrode
- Ga, In doped ZnO for TCO
Emerging Oxide

- Photocatalytic decomposition
- Decomposition of organics using photocatalyst (TiO2)
- Self-cleaning applications

- Hydrophobic coatings
- Hydrophobic rare-earth oxides (Er2O3, Y2O3, La2O3, Dy2O3, CeO2, etc. )
- Applied to clothes, water aggregators, wings of airplane, oil/water separator